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INTERNATIONAL PATENT: AESC JAPAN LTD., 株式会社AESCジャパン FILES APPLICATION FOR "NEGATIVE ELECTRODE ACTIVE MATERIAL, NEGATIVE ELECTRODE, LITHIUM-ION SECONDARY BATTERY AND LITHIUM-ION SECONDARY BATTERY MODULE"

GENEVA, Oct. 5 -- AESC JAPAN LTD. (K-Tower Yokohama, 6-2-12 Minatomirai, Nishi-ku, Yokohama-shi, Kanagawa2200012), 株式会社AESCジャ&#124... Read More


INTERNATIONAL PATENT: SEKISUI FULLER COMPANY, LTD., 積水フーラー株式会社 FILES APPLICATION FOR "PHOTOCURABLE RESIN COMPOSITION"

GENEVA, Oct. 5 -- SEKISUI FULLER COMPANY, LTD. (16-2, Konan 2-chome, Minato-ku, Tokyo1080075), 積水フーラー株式会社 (東京&#37117... Read More


INTERNATIONAL PATENT: MITSUBISHI PENCIL COMPANY, LIMITED, 三菱鉛筆株式会社 FILES APPLICATION FOR "COSMETIC APPLICATOR"

GENEVA, Oct. 5 -- MITSUBISHI PENCIL COMPANY, LIMITED (5-23-37, Higashi-Ohi, Shinagawa-ku, Tokyo1408537), 三菱鉛筆株式会社 (東京都&#216... Read More


INTERNATIONAL PATENT: UNICHARM CORPORATION, ユニ・チャーム株式会社 FILES APPLICATION FOR "ABSORBENT ARTICLE"

GENEVA, Oct. 5 -- UNICHARM CORPORATION (182, Shimobun, Kinsei-cho, Shikokuchuo-City, Ehime7990111), ユニ・チャーム株式会社 (愛&#... Read More


INTERNATIONAL PATENT: HODOGAYA CHEMICAL CO., LTD., 保土谷化学工業株式会社 FILES APPLICATION FOR "ORGANIC ELECTROLUMINESCENT ELEMENT"

GENEVA, Oct. 5 -- HODOGAYA CHEMICAL CO., LTD. (1-9-2, Higashi-Shimbashi, Minato-ku, Tokyo1050021), 保土谷化学工業株式会社 (東&#2... Read More


INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE"

GENEVA, Oct. 5 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東&#20... Read More


INTERNATIONAL PATENT: NIPPON STEEL CORPORATION, 日本製鉄株式会社 FILES APPLICATION FOR "SKELETON MEMBER, VEHICLE BODY AND METHOD FOR MANUFACTURING SKELETON MEMBER"

GENEVA, Oct. 5 -- NIPPON STEEL CORPORATION (6-1, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008071), 日本製鉄株式会社 (東京都千&#2019... Read More


INTERNATIONAL PATENT: MITSUBISHI CHEMICAL CORPORATION, 三菱ケミカル株式会社 FILES APPLICATION FOR "GAN SUBSTRATE, METHOD FOR PRODUCING GAN CRYSTAL AND METHOD FOR PRODUCING GAN SUBSTRATE"

GENEVA, Oct. 5 -- MITSUBISHI CHEMICAL CORPORATION (1-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008251), 三菱ケミカル株式会社 (東&#20140... Read More


INTERNATIONAL PATENT: NOF CORPORATION, 日油株式会社 FILES APPLICATION FOR "POLYETHER, COSMETIC BASE AND COSMETIC"

GENEVA, Oct. 5 -- NOF CORPORATION (20-3, Ebisu 4-chome, Shibuya-ku, Tokyo1506019), 日油株式会社 (東京都渋谷区恵比&#2... Read More


INTERNATIONAL PATENT: TEIJIN LIMITED, 帝人株式会社 FILES APPLICATION FOR "POROUS MEMBRANE WOUND BODY, BASE MATERIAL FOR FILTER AND CARTRIDGE FILTER"

GENEVA, Oct. 5 -- TEIJIN LIMITED (2-4, Nakanoshima 3-chome, Kita-ku, Osaka-shi, Osaka5300005), 帝人株式会社 (大阪府大阪市&#21271... Read More